Seminars

Details

The seminars are held on Fridays, usually from 11:00.

Locations :

Seminars

Datum
Date
Raum
Room
Titel
Title
Dozent(in)
Speaker
23.05.2025ZOOMlnvestigation into NBTI parameter drift for plasma-induced damage-degraded PMOS transistorsKexin Zhou
28.03.2025S2damage-degraded PMOS transistorsArash Mohammadi
21.03.2025S2Herstellung und Charakterisierung von selektiv abgeschiedenen quasi-vertikalen GaN-BauelementenAlexander Brand
24.01.2025S2Investigation of 2D-Memristors: Material Choice and Area ScalingBor-Han Chen
24.01.2025S2Device Fabrication Based on Oxidative Chemical Vapor Deposition (oCVD) of Conducting PolymersJiayi Shen
17.01.2025S2AlGaN/GaN-Based Optoelectronic Synaptic Devices for Neuromorphic ComputingOzan Candaş
17.01.2025S2Recent Progress in Inkjet-Printed Thin-Film TransistorsAlexandros-Spyridon Asonitis
10.01.2025S2The origin and mitigation of defects induced by metal evaporation in 2DGi-Hyun Paik
10.01.2025S2The new nitridesCem Tarhan
25.10.2024ZOOMInvestigating Substrate Surface Properties for Synthesis of 2D materials on Oxide substratesXavier Garcia
25.10.2024ZOOMProcessing and characterization of N-polar GaN layersLiubou Padzialioshkina
11.10.2024S2Influence of MOCVD Parameters on the Electrical Properties of 2D-WSe2Jiancheng Xu
02.10.2024
Mi / Wed
10 Uhr / 10 am
S1Epitaxie, Prozessierung und Charakterisierung von AIGaN-Gradientenstrukturen und GaN/AIGaN-Heterostrukturen für die Anwendung von polarisationsinduzierten LöcherdichtenCarsten Beckmann
13.09.2024S2Anwendung von polarisationsinduzierten LöcherdichtenAleksandar Ivanov
23.08.2024S2Investigation of locally back-gated MOCVD-MoS2 FETTianyuan Yu
26.07.2024S2Fabrication optimization of area-scaled MoS2-based memristorsNorwin Ridder
26.07.2024S2Herstellung und Charakterisierung von selektiv abgeschiedenen quasi-vertikalen GaN-BauelementenAlexander Brand
19.07.2024S2Neuromorphic Computing using Non-Volatile MemoryVaishnavi Chaturvedi
12.07.2024S225 Years of Light-Emitting Electrochemical Cells: A Flexible and Stretchable PerspectiveEvrim Yagiz
12.07.2024S2Charge-Carrier Recombination in Halide PerovskitesSpyridon Mavrokefalidis
21.06.2024S2Gate Recess für AlGaN/GaN-FeldeffekttransistorenMoritz Ellering
14.06.2024S2Mask-set design for normally-off monolithic bidirectional GaN-based switchesChong Peng
07.06.2024S2Internship reportsAleksandar Ivanov
07.06.2024S2Towards Ultraflexible Organic Electronic Devices: Mechanical Properties and EncapsulationArash Mohammadi
16.05.2024,
11:00
Thursday!
S2Thermal annealing of etch-damage in quasi-vertical Schottky diodesKexin Zhou
02.02.2024S1Insulators for 2D nanoelectronics: the gap to bridgeVinh Liem Do
02.02.2024S1Applications of Boron Nitride (BN) in III-Nitride and 2D TechnologyZi Cheng Lai
02.02.2024S1Recent progress in organic field-effect transistor-based integrated circuitsJonas Tillmann
26.01.2024S1Fabrication flow optimization of 2D-MoS2-based cross-point memristorsBor-Han Chen
26.01.2024S1GaN on foreign Substrates for Application in vertical DevicesCengiz Kuruoglu
19.01.2024ZOOMPraktikum bei AIXTRON: ein Erfahrungsbericht Martin Schmitz
19.01.2024ZOOMIn situ optical reflectance analysis of a MOCVD process for transition metal dichalcogenides synthesisMartin Schmitz
19.01.2024ZOOMImpact of cool-down conditions on the electrical performance of MOCVD 2D WSe₂Jülide Avci
12.01.2024S1MOCVD and Characterization of MoS₂ and WSe₂ Monolayers and their Vertical HeterostructuresSusu Zhang